920134
Graphene, monolayer film
6 in diameter, CVD on silicon wafer, large grain, avg. no. of layers, 1
别名:
Roll-to-Roll graphene
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产品名称
R2R Monolayer large grain CVD graphene on silicon wafer, 6 in diameter, avg. no. of layers, 1
Quality Level
description
Growth method: roll-to-roll CVD
Wafer: SiO2 (300nm) Si
Number of layer: Monolayer
Raman intensity 2D/G: ≥1.5
feature
avg. no. of layers 1
sheet resistance
280 Ω/sq ±10%
size
110 μm × 110 μm ± 10%, grain size
surface coverage
surface coverage >98%
transmittance
>97%
semiconductor properties
(mobility>3000 cm2/V·s) (Hall effect measurements)
SMILES string
NC.NC.NC.NC.NC.NC.NC.NC.NC
InChI
1S/9CH5N/c9*1-2/h9*2H2,1H3
InChI key
DXIFQVRACSPGSU-UHFFFAOYSA-N
General description
Roll-to-roll, high-quality, monolayer CVD graphene with large grain size (~110μm^2) on 6 inch silicon wafer.
Application
Our Roll-to-Roll CVD graphene products are true monolayer high quality graphene, fabricated inside a Cleanroom, heavily monitored and QC to assure high reproducibility.
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
The roll-to-roll process allows continuous, large scale graphene production.
This large grain size graphene product on silicon wafer is ready to use, helps you minimize process time, and increase success rate. This product with low sheet resistance would enable unmatched reproducibility and allow high performance for CVD graphene based FET, CVD graphene based sensors, and heterostructure based micro/nano electronics.
Application examples:
- Ultrafast Transistor
- Optical devices
- Bio/Gas Sensor
- Transparent Electrode
- Flexible Display
- Smart Coating
- Thermal management
Preparation Note
Avoid direct sun light, avoid high temperature, avoid high humidity, and avoid dust.
Legal Information
Product of LG Electronics, R&D use only
Disclaimer
Be cautious not to drop
Keep away from contamination, heat, dust and flame etc.
Keep away from contamination, heat, dust and flame etc.
存储类别
11 - Combustible Solids
wgk
WGK 3
法规信息
新产品
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商品
Review on 1D vdWHs: Discusses materials, synthesis, optoelectronic applications, challenges, and future perspectives for 1D vdWH-based devices.
Integrating graphene into semiconductor fabrication lines.
Daniel Neumaier et al.
Nature materials, 18(6), 525-529 (2019-05-23)
Bing Deng et al.
Advanced materials (Deerfield Beach, Fla.), 31(9), e1800996-e1800996 (2018-10-03)
Chemical vapor deposition (CVD) is considered to be an efficient method for fabricating large-area and high-quality graphene films due to its excellent controllability and scalability. Great efforts have been made to control the growth of graphene to achieve large domain
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 920134-1EA | 04065265670326 |