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About This Item
Linear Formula:
(CH3)3SiOSi(CH3)3
CAS Number:
Molecular Weight:
162.38
UNSPSC Code:
12352103
NACRES:
NA.22
PubChem Substance ID:
EC Number:
203-492-7
Beilstein/REAXYS Number:
1736258
MDL number:
vapor density
>1 (vs air)
Quality Level
assay
≥98%
form
liquid
refractive index
n20/D 1.377 (lit.)
bp
101 °C
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
General description
Hexamethyldisiloxane (HMDSO), a linear polydisiloxane, is an organosilicon reagent commonly utilized as a source for plasma enhanced chemical vapor deposition (PE-CVD) of thin films of silicon compounds. It is also employed as a substitute to silane in silicon integrated circuit technology. Its dissociative ionization by electron impact has been studied by Fourier transform mass spectrometry. Synthesis of plasma-polymerized HMDSO thin films by atmospheric pressure glow (APG) discharge has been reported. Crystals of HMDSO at 148K are monoclinic. Addition of HMDSO to P4S10, improves its efficiency as thionating agent.
Application
Hexamethyldisiloxane can be used:
- To fabricate a gas diffusion layer (GDL) with controlled hydrophobic silicone nano-layer by the dry deposition process.
- To prepare silver nanoparticles coated with silica using arginine and glucose as the catalyst and the reducing agent, respectively.
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signalword
Danger
hcodes
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
Storage Class
3 - Flammable liquids
wgk
WGK 2
flash_point_f
21.2 °F - closed cup
flash_point_c
-6 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
Regulatory Information
危险化学品
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Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Schmidt-Szalowski K, et al.
Plasmas and polymers, 5(3-4), 173-190 (2000)
Israel Sifuentes-Nieves et al.
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in
The Raman Spectra of Hexamethyldisilane and Hexamethyldisiloxane.
Murata H and Kumada M.
J. Chem. Phys., 21(5), 945-945 (1953)
Global Trade Item Number
| SKU | GTIN |
|---|---|
| 205389-100ML | 04061838767684 |
| 205389-500ML | 04061838767691 |
| 205389-5ML | 04061838767707 |

