Select a Size
About This Item
form
solid
Quality Level
composition
Ni, 20.0-31.5% EDTA titration
reaction suitability
core: nickel, reagent type: catalyst
mp
171-173 °C (lit.)
SMILES string
[Ni].[CH]1[CH][CH][CH][CH]1.[CH]2[CH][CH][CH][CH]2
InChI
1S/2C5H5.Ni/c2*1-2-4-5-3-1;/h2*1-5H;
InChI key
FOOKRXHSBKEWSE-UHFFFAOYSA-N
Application
signalword
Danger
hcodes
Hazard Classifications
Acute Tox. 4 Oral - Carc. 1A - Flam. Sol. 1 - Skin Sens. 1
Storage Class
4.1B - Flammable solid hazardous materials
wgk
WGK 3
flash_point_f
Not applicable
flash_point_c
Not applicable
ppe
Eyeshields, Faceshields, Gloves, type P3 (EN 143) respirator cartridges
Choose from one of the most recent versions:
Already Own This Product?
Find documentation for the products that you have recently purchased in the Document Library.
Articles
近十年来出现了原子层沉积(ALD)技术以满足各种需求,包括半导体器件小型化、多孔结构上的保形沉积和纳米颗粒涂层。ALD基于两个相继的自限性表面反应。
Spintronics offer breakthroughs over conventional memory/logic devices with lower power, leakage, saturation, and complexity.
Atomic layer deposition meets various needs including semiconductor device miniaturization and nanoparticle coating.
Global Trade Item Number
| SKU | GTIN |
|---|---|
| N7524-5G | 04061834118077 |


