vapor density
>1 (vs air)
Quality Level
assay
≥98%
form
liquid
refractive index
n20/D 1.377 (lit.)
bp
101 °C
mp
−59 °C (lit.)
density
0.764 g/mL at 20 °C (lit.)
SMILES string
C[Si](C)(C)O[Si](C)(C)C
InChI
1S/C6H18OSi2/c1-8(2,3)7-9(4,5)6/h1-6H3
InChI key
UQEAIHBTYFGYIE-UHFFFAOYSA-N
General description
六甲基二硅氧烷（HMDSO）是一种线性聚二硅氧烷 ，这种有机硅试剂通常被用作通过等离子体增强化学气相沉积（PE-CVD）技术制备硅化合物薄膜的源气体。在硅集成电路技术中，它还用作硅烷的替代品。已采用傅里叶变换质谱对其通过电子轰击产生的离解电离进行了研究。通过大气压辉光（APG）放电合成等离子体聚合的HMDSO薄膜已被报道。在148K的HMDSO晶体是单斜晶体。在P4S10中添加HMDSO可提高其作为硫化剂的效率。
Application
六甲基二硅氧烷可用于：
- 通过干法沉积工艺来制造具有受控疏水性有机硅纳米层的气体扩散层（GDL）。
- 分别使用精氨酸和葡萄糖作为催化剂和还原剂制备涂有二氧化硅的银纳米颗粒。
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signalword
Danger
hcodes
Hazard Classifications
Aquatic Acute 1 - Aquatic Chronic 1 - Flam. Liq. 2
存储类别
3 - Flammable liquids
wgk
WGK 2
flash_point_f
21.2 °F - closed cup
flash_point_c
-6 °C - closed cup
ppe
Eyeshields, Faceshields, Gloves, type ABEK (EN14387) respirator filter
法规信息
危险化学品
此项目有
Thin films deposition from hexamethyldisiloxane and hexamethyldisilazane under dielectric-barrier discharge (DBD) conditions.
Schmidt-Szalowski K, et al.
Plasmas and polymers, 5(3-4), 173-190 (2000)
Israel Sifuentes-Nieves et al.
International journal of biological macromolecules, 144, 682-689 (2019-12-21)
In the present study, the effect of plasma treatment on the structural properties of three granular corn starches (normal, Hylon V and Hylon VII) was investigated. Thermal (TGA/DSC), structural (XRD/FTIR) and chemical (XPS) properties were evaluated. Plasma treatment resulted in
The Raman Spectra of Hexamethyldisilane and Hexamethyldisiloxane.
Murata H and Kumada M.
J. Chem. Phys., 21(5), 945-945 (1953)
全球贸易项目编号
| 货号 | GTIN |
|---|---|
| 205389-100ML | 04061838767684 |
| 205389-500ML | 04061838767691 |
| 205389-5ML | 04061838767707 |